Dual Ion Beam Sputtering System
The Veeco-Iontech SPECTOR® Dual Ion Beam Sputtering (DIBS)
system is fully automated and is capable of depositing multilayer
dielectric films up to several hundred layers thick. The system
is designed for a variety of precision optics applications, such
as AR coatings, complex non-quarter wave coatings and ultra low-loss
laser mirrors with very low absorption and scatter.
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Present characteristics include:
- 16cm and 12cm RF ion guns.
- 3 Position Oscillating Target currently used for deposition
of
- Silicon Dioxide, Tantalum Pentoxide, and Niobium Pentoxide.
- In-situ optical monitoring of layer deposition process.
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