Coatings
Bartlett; H. Jaeger; B.A. Sexton, and R.P. Netterfield and P.J.
Martin. ''A scanning tunnelling and transmission electron microscopy
comparison of the surface structure of evaporated and ion-assisted
gold films''. Applied Surface Science. 1991; 47, ((2) ):187191.
Bendavid, A.; Martin, P. J.; Netterfield , R. P., and Kinder
, T. J. Characterisation of the optical properties and composition
of TiN, thin films by spectroscopic ellipsometry and X-ray photoelectron
spectroscopy . Surf. Interf. Anal. 1995.
Note: Also presented at Australasia-Asia XPS Symposium 1995, Sydney
(Nov. 1995).
Bendavid, A.; Martin, P. J.; Netterfield, R. P., and Kinder,
T. J. Characterisation of the optical properties and composition
TiN thin films by spectroscopic ellipsometry and x-ray spectroscopy.
Surface and Interface Analysis. 1996; 24:627-633
Bendavid, A.; Martin, P. J.; Netterfield, R. P.; Sloggett, G.
J.; Kinder, T. J., and Andrikidi. The deposition of niobium NbN
and Nb205 films by filtered arc evaporation. J. Mat. Sci. Lett.
1993; 12, 322-323.
Bendavid, A.; Martin, P. J.; Netterfield, R. P.; Sloggett, G.
J.; Kinder, T. J., and Andrikidis, C. The deposition of niobium,
NbN and Nb205 films by filtered arc evaporation. J. Mat. Sci.
Lett. 1993; 12, 322-323.
Binh L N; Chung S V; Netterfield R P, and Martin P J. Design
considerations for second harmonic generation in thin film grown
by ion beam assisted deposition method. Proc. 3rd Int. Laser Conf.
- Melbourne, August 10A. 13-15 (1983). 1983:101315.
Binh L N; Netterfield R P, and Martin P J. Low-loss waveguiding
in ion-assisted-deposited thin films. Appl. Surf. Sci. 1985; 22/23:65662.
Dligatch, S.; Netterfield, R. P.; Drage, D. J., and Fairman,
P. S. Fabrication of multi-layer optical coatings with demanding
broad band specifications. Applied Optics.
---. Fabrication of multi-layer thin film designs which are highly
sensitive to manufacturing errors. 13th Conference of the Australian
Optical Society; Adelaide, S. Aust. 2000.
Dligatch S; Netterfield RP, and Drage DJ. In-Situ Ellipsometric
Monitoring of Multilayer Optical CoatingsSydney University; 1999.
---. Recent developments in ion-assisted deposition techniques
for multi-layer optical thin films.
Drage D.J.; Netterfield R.P.; Dligatch S.; Blenman N.; Fairman
P.S., and Katsaros A. and Preston E.W. Progress Towards a Small-Scale,
Automated Optical Thin-Film Production CapabilityAdelaide.
Drage DJ; Netterfield RP, and Dligatch S. Improved Techniques
in Multilayer Optical Thin Film DepositionSydney University; 1999.
Drage DJ; Netterfield RP, and Freund CF. In Situ Ellipsometric
Monitoring of Dielectric Optical Thin Films; 1998.
M Glass and R P Netterfield . Thin Film Measurement Instrument
for ALUSUISSE Laboratory Tests and Instruction Manual ; 2000.
M\uller K-H; Netterfield R P, and Martin P J. Dynamics of zirconium
oxide thin-film growth and ion-beam etching. Phys. Rev. B. 1987;
35(6):293441.
Martin; P.J.; Bendavid; A.; Swain; M.V.; Netterfield; R.P.; Kinder;
T.J.; Sainty; W.G.; and Drage, and D. Mechanical and optical properties
of thin films of tantalum oxide deposited by ion-assisted deposition.
Mat. Res. Symp. Proc. 1993; 308:583588.
Martin; P.J.; Macleod; H.A.; Netterfield; R.P.; Pacey; C.G. and
Sainty, and W.G. Ion-beam-assisted deposition of optical films.
1982.
Martin; P.J.; McKenzie; D.R.; Netterfield; R.P.; Swift; P.; Filipczuk;
S.W.; Müller; K.-H.; Pacey; C.G. and James, and B. Characteristics
of Ti arc evaporation processes. Thin Solid Films. Also Presented
at the International Conference on Metallurgical Coatings, San
Diego U.S.A. March (1987). 1987; 153:91102.
Martin; P.J.; Netterfield; R.P.; and Kinder, and T.J. Optimisation
of the deposition parameters for low-energy IAD of TiN: Part A.
1988.
Martin; P.J.; Netterfield; R.P.; Filipczuk; S.W. and Pacey, and
C.G. (INVITED), Arc evaporation - problems and potential. 1987.
Martin; P.J.; Netterfield; R.P.; Kinder; T.J.; and Bendavid,
and A.. Stress and optical properties of ion-assisted aluminum
nitride thin films. Appl. Opt. 1992; 31:67346740.
Martin; P.J.; Netterfield; R.P.; Kinder; T.J. and Stambouli,
and V. In-Situ measurements of ion assisted MgF2 and SiOx thin
films. Appl. Phys. Lett. 1991; 58: 24972499.
Martin; P.J.; Netterfield; R.P.; Sainty; W.G. and Mackenzie,
and D. Optical properties of thin amorphous silicon and amorphous
hydrogenated silicon films produced by ion-beam techniques. Thin
Solid Films . 1983; 100:1417.
Martin; P.J.; Netterfield; R.P. and Kinder, and T.J.. In-situ
stress measurements of ion assisted MgF2, SiOx and sputtered Cr
thin films. 1991.
Martin; P.J.; Netterfield; R.P. and Kinder, and T.J. Optimisation
of the deposition parameters for low-energy IAD of TiN: Part B.
1988.
Martin; P.J.; Netterfield; R.P. and Sainty, and W.G. Optical
properties of TiNx produced by reactive evaporation and reactive
ion beam sputtering. Vacuum . 1982; 32:35962.
Martin; P.J.; Netterfield; R.P. Pacey; C.G.; Tomas; P. and Sainty,
and W.G. Characterisation of a Ti vacuum arc and the structure
of deposited Ti and TiN films. J. Vac. Sci. Technol. 1987; A5:
228.
Martin; P.J. and Netterfield, and R.P. The application of low
energy ion beams to the production of optical thin films. 1982.
---. Optimization of deposition parameters in ion-assisted deposition
of optical thin films. Thin SolidFilms . 1991; 199: 351358.
MARTIN P J; BENDAVID A; KINDER T, and NETTERFIELD R. 'Plasma
Deposition of Tribological and Optical Thin Film Materials with
a Filtered Arc Process'. Surface & Coatings Technology. 1997.
Martin P J; Bendavid A; Swain M; Netterfield R P; Kinder T J;
Sainty W G; Drage D, and Wielunski L. Properties of thin films
of tantalum oxide deposited by ion-assisted deposition. Thin Solid
Films. 1994; 239:1816.
Martin P J; Bendavid A; Swain M V; Netterfield R P, and Kinder
T J. Mechanical and optical properties of thin films of tantalum
oxide deposited by ion-assisted deposition. Proc. From the MRS
Symposium - . 1993; 308:5838.
---. ''Mechanical and Optical Properties of thin Films of Tantalum
Oxide Deposited by Ion-Assisted Deposition''. Thin Solid Films
. 1994; 239, 181185.
Martin P J; Filipczuk S W; Netterfield R P; Field J S; Whitnall
D F, and McKenzie D R. Structure and hardness of diamond-like
carbon films prepared by arc evaporation. J. Mater. Sci. Lett.
1988; 7:4102.
Martin P J; Macleod H A; Netterfield R P; Pacey C G, and Sainty
W G. Ion-beam-assisted deposition of thin films. Appl. Opt. 1983;
22:17884.
Martin P J; McKenzie D R; Netterfield R P; Swift P; Filipczuk
S W andi M\uller K-H; Pacey C G, and James B. Characteristics
of titanium arc evaporation processes. Thin Solid Films. 1987;
153:91102.
Martin P J and Netterfield R P. Ion-assisted deposition of magnesium
fluoride films on substrates at ambient temperatures. Appl. Opt.
1985; 24:1732.
---. Ion-assisted dielectric and optical coatings. Chapter in:
`Handbook of Ion Beam Processing Technology - . 1989:37344.
---. Ion-beam-deposited thin film coatings for solar energy devices.
Confidential Reports NERDDC Report S33NG/PK (1983). 1983; S33NG/PK.
---. Ion scattering spectroscopy studies of zirconium dioxide
thin films prepared in-situ. Surf. Interface Anal. 1987; 10:136.
---. Optical films produced by ion-based techniques. Prog. Opt.
- XXIII: III Ed. E. Wolf (Elsevier Sci. Publ. B.V.) . 1986; XXIII:11582.
---. Optimisation of deposition parameters in ion assisted deposition
of optical thin films. Thin Solid Films. 1991; 199:3518.
Martin P J; Netterfield R P; Bendavid A, and Kinder T J. The
deposition of thin films by filtered arc evaporation. Surf. Coat.
Technol. 1992; 54/55:13642.
---. Properties of thin films produced by filtered arc deposition.
Proc. of 36th Ann.Tech.Conf. Soc.Vac.Coat. Dallas - April 1993.
1993:3759.
Martin P J; Netterfield R P; Descotes L, and Kinder T J. Deposition
of TiN, TiC and TiO2 films by filtered arc evaporation. Proc.
From the Surf. Coat. Techn. Conf. (ICMCTF91) - . 1991; 49:23943.
Martin P J; Netterfield R P; Filipczuk S W, and Pacey C G. Arc
evaporation - problems and potential. Proc. of the IEA Int. Tribology
Conf. - . 1987:759.
Martin P J; Netterfield R P, and Kinder T J. In-situ stress measurements
of ion-assisted MgFe and SiO$_x$ thin films. Appl. Phys. Lett.
1991; 58(22):24979.
---. Ion beam deposited films produced by filtered arc evaporation.
Thin Solid Films. 1990; 193/4:7783.
Martin P J; Netterfield R P; Kinder T J, and Descotes L. Metallurgical
and optical thin films producted by filtered arc evaporation.
Conf. Proc. Surface Engineering: Practice and Prospects, Adelaide
- . 1990.
Martin P J; Netterfield R P, and McKenzie D R. Properties of
indium tin oxide films prepared by ion- assisted deposition. Thin
Solid Films. 1986; 137:20714.
Martin P J; Netterfield R P; McKenzie D R; Falconer I S; Pacey
C G; Tomas P, and Sainty W G. Characterization of a Ti vacuum
arc and the structure of deposited Ti and TiN films. J. Vac. Sci.
Technol. A. 1987; 5:228.
Martin P J; Netterfield R P, and Sainty W G. The modification
of the optical and structural properties of dielectric ZrO$_2$
films by ion-assisted deposition. J. Appl. Phys. 1984; 55:23541.
---. Optical properties of thin amorphous silicon and amorphous
hydrogenated silicon films produced by ion beam techniques. Thin
Solid Films. 1983; 100:1417.
---. Spectrally selective PbS films produced by ion beam sputtering.
Thin Solid Films. 1982; 87:2036.
Martin P J; Netterfield R P; Sainty W G; Clark G J; Lanford W
A, and Sie S H. Ion-assisted deposition of bulklike ZrO$_2$ films.
Appl. Phys. Lett. Also IBM Research. Report RC 10022 (1983). 1983;
43:7113.
Martin P J; Netterfield R P; Sainty W G, and Pacey C G. The preparation
and characterization of optical thin films produced by ion-assisted
deposition. J. Vac. Sci. Technol. Also Presented at 30th Nat.
Symp. American Vac. Soc., Boston (1983). 1984; 2:3415.
---. Review of the optical properties of thin films produced
by ion-assisted deposition. Proc. of the 3rd Conf. of the Aust.
Opt. Soc. - Sydney, August N-1 1-2 (1985). 1985; N-1:12.
---. Summary abstract: In-situ characterization of nucleation,
growth and composition of ion-assisted films by ellipsometry,
reflectance-transmittance measurements, and on-scattering spectroscopy.
J. Vac. Sci. Technol. Also Presented at the 32 National American
Vacuum Society Symposium, Houston November 1985 . 1986; 4:4634.
Martin P J; Sainty W G, and Netterfield R P. Enhanced gold film
bonding by ion-assisted deposition. Appl. Opt. 1984; 23:26689.
Martin P J; Sainty W G; Netterfield R P, and Buckley A N. Oxygen-ion-assisted
deposition of thin gold films. Vacuum (TAIP Special Issue) . 1985;
35:6214.
McKenzie D R; Green D C; Swift P D; Cockayne D J H; Martin P
J; Netterfield R P, and Sainty W G. Electron optical techniques
for microstructural and compositional analysis of thin films.
Thin Solid Films. 1990; 193/194:41830.
McKenzie D R; McPhedran R C; Boten L C; Savvides N, and Netterfield
R P. Hydrogenated carbon films produced by sputtering in argon-hydrogen
mixtures. Appl. Opt. 1982; 21:36157.
McKenzie D R; McPhedran R C; Savvides N; Botten L C; Martin P
J, and Netterfield R P. Methods of determining optical constants
of thin semiconductor films using normal incidence reflectance
and transmittance data. Proc. Soc. Photo-Optical Instrum. Eng.(SPIE)
- . 1982; 369:11017.
McPhedran R C; Botten L C; McKenzie D R, and Netterfield R P.
Unambiguous determination of optical constants of absorbing films
by reflectance and transmittance measurements. Appl. Opt. 1984;
23:1197205.
Netterfield; R.P.; Martin; P.J.; and Sainty, and W.G. Ion-assisted-deposition
of thin films. 1983.
Netterfield; R.P.; Martin; P.J.; Muller; K.-H.; Sainty; W.G.;
Pacey; C.G. and Filipczuk, and S.W. Monitoring of thin-film growth
by in-situ ellipsometry. 1988.
Netterfield; R.P.; Martin; P.J.; Pacey; C.G. and Kinder, and
T.J. Some methods for producing colour variations for decorative
coatings. 1988.
Netterfield; R.P.; Martin; P.J.; Sainty; W.G.; Duffy; R.M. and
Pacey, and C.G. Characterisation of growing thin films by in situ
ellipsometry, spectral reflectance and transmittance measurements,
and ion-scattering spectroscopy. Rev. Sci. Instrum. 1985; 56:
19952003.
Netterfield; R.P. and Martin, and P.J. Modification of optical
properties of thin films produced by ion-assisted technology.;
1983.
Netterfield R P. Ion-assisted processes in optical thin film
deposition. SPIE Optical Thin Films II: New Developments. 1986;
678:1423.
---. Optical thin-film coatings - A status report. Aust. Lasers
Opt. 1985; 3(1):145.
---. some optical techniques used to characterise \it in-situ\/
the properties of thin films during growth. Proc. of the 1st Australian-USA
Workshop on Critical Issues in High Performance Wear Resistant
Films (AUSAWWRF 95) - . 1995:22.
---. Some recent developments in optical thin film deposition.
AOS News. 1991; 5(4):224.
---. Uniform evaporated coatings on rotating conical workholders.
J. Vac. Sci. Technol. 1981; 19(2):21620.
Netterfield R.P.; Dligatch S., and Drage D. Mackay T. and Bailey
A. Thin film laser protection filters - Design and production
considerationAdelaide; 2000.
Netterfield R P and Llewellyn I. Narrow-Band Notch Filters Produced
by Plamsa Impulse Chemical Vapour Deposition; 1998.
Netterfield R P; M\uller K-H; McKenzie D R; Goonan M J, and Martin
P J. Growth dynamics of aluminium nitride and aluminium oxide
thin films synthesized by ion-assisted deposition. J. Appl. Phys.
1988; 63(3):7609.
Netterfield R P and Martin P J. Modification of optical properties
of thin films. Proc. Int. Ion Eng. Congr. ISIAT'83 & IPAT'83
- . 1983:90914.
---. Nucleation and growth studies of gold films prepared by
evaporation and ion-assisted deposition. Appl. Surf. Sci. 1986;
25:26578.
Netterfield R P; Martin P J; Bendavid A, and Kinder T J. Synthesis
of silicon nitride by sequential magnetron sputtering of silicon
and nitrogen ion bombardment. Proc. From the Opt. Interference
Coatings Topical Meeting - . 1992:2635.
Netterfield R P; Martin P J, and Kinder T J. Data pack for the
production of coatings on large substrates in a factory environment.
Confidential Report (June 1992). 1992(C00107).
---. Ion-assisted deposition: film properties and process monitoring.
Proc. Conf. Surface Engineering: Practice and Prospects - . 1990.
---. Materials for magneto-optical storage. Properties of silicon
nitride thin films prepares by IAD, magnetron sputtering, and
magnetic deposition. 1991(C00110).
---. Real-time monitoring of optical properties and stress in
thin films. Proc. From the Meet. of the Soc. of Vacuum Coaters
- . 1993.
Netterfield R P; Martin P J; Kinder T J, and Bendavid A. Properties
of magneto-optical thin films. Proc. From the AOS Meeting - .
1993.
Netterfield R P; Martin P J; M\uller K-H; Sainty W G; Pacey C
G, and Filipczuk S W. In-situ ellipsometric monitoring and modelling
of the growth and synthesis of thin films. OSA Proc. Tech. Digest
of 4th Topical Meeting on Optical Interference Coatings - Tucson
USA, April, Pp 72-5 (1988). 1988; 6:725.
Netterfield R P; Martin P J, and McKenzie D R. Properties of
ZrN$_x$ prepared by Ion-assisted Deposition. J. Mater. Sci. Lett.
1989; 9:9724.
Netterfield, R. P.; Martin, P. J., and Muller, K.-H. In-situ
optical monitoring of thin film deposition. SPIE - In-Process
Opt. Meas. 1988; 1012:105.
Netterfield R P; Martin P J; Pacey C G; Sainty W G; McKenzie
D R, and Auchterlonie G. Ion-assisted deposition of mixed TiO$_2$-SiO$_2$
films. J. Appl. Phys. 1989; 66(4):18059.
Netterfield R P; Martin P J, and Sainty W G. Synthesis of silicon
nitride and silicon oxide films by ion-assisted deposition. Appl.
Opt. 1986; 25:38089.
Netterfield R P; Martin P J; Sainty W G; Duffy R M, and Pacey
C G. Characterization of growing thin films by in situ ellipsometry,
spectral reflectance and transmittance measurements, and ion-scattering
spectroscopy. Rev. Sci. Instrum. 1985; 56:19952003.
Netterfield R P; Martin P J; Sainty W G, and Pacey C G. Studies
of the growth of thin films by optical methods and ion-scattering
spectroscopy. Proc. From the 3rd Conf. of the Aust. Opt. Soc.
- Sydney, August M-4 17-18 (1985). 1985; M-4:178.
Netterfield R P and Preston E. Plasma Impulse Chemical Vapour
Deposition (PICVD) - potential for automated multiplayer deposition
of optical coatings; 1998.
Netterfield R P; Sainty W G; Martin P J, and Sie S H. Properties
of CeO$_2$ thin films prepared by oxygen-ion-assisted deposition;
1985: 226772.
Netterfield R P; Schaeffer R C, and Sainty W C. Coating Fabry-Perot
interferometer plates with broadband multilayer dielectric mirrors.
Appl. Opt. 1980; 19:30107.
Netterfield RP and Dligatch S. Notch Filter Design Study; 1999.
Netterfield RP; Drage DJ; Dligatch S, and Cronin J. Design and
Production of Thin Film Notch FiltersSydney University.
Netterfield RP; Drage DJ; Freund CH; Walsh CJ; Leistner AJ; Seckold
JA, and OrebBF. Coating requirements for the reference flat of
a Fizeau interferometer used for measuring highly reflecting surfacesBerlin;
1999: 128135.
Oreb BF; Netterfield RP; Walsh CJ; Freund CH; Leistner AJ, and
Seckold JA. Characterisation of wavefront variations in coated
optics (paper modified from original abstract submission)Denver
18-23 July 1999; 1999.
---. Distortion and phase effects of coatings on precision optical
surfacesSydney Uni, 1999; 1999.
P.J. Martin; R.P. Netterfield, and A. Bendavid and T.J.Kinder
. ''The Deposition of lhin Films by Filtered arc evaporation''.
Surf. and Coating Technol. 1992; 54/55, (136-142 ).
P.J. Martin; R.P. Netterfield, and and T.J. Kinder. ''Arc Source
Macropartial Filter''. Patent No. PK 5282 (1993). 1993.
P.J. Martin; R.P. Netterfield; T.J. Kinder, and V. Stambouli.
''In situ stree measurements of ion-assisted MgF/sub 2/ and SiO/sub
x/ thin films'. Applied Physics Letters. 1991; 58 ((22) ):24972499.
P.J. Martin; R.P. Netterfield, and T. J. Kinder and A. Bendavid.
''Optical Properties and Stress ofIon-Assisted Aluminium Nitride
lhin Films. Appl. Opt. 1992; 31, 67346740.
R.P. Netterfield and P.J. Martin and T.J. Kinder. ''Properties
of silicon nitride thin films prepared by IAD, magnetron sputtering,
and NIAGIC deposition''; 1991.
RP Netterfield. Review of thin film deposition techniquesBanff-Canada.
S Dligatch; RP Netterfield; DJ Drage, and PS Fairman. Fabrication
of Multilayer Optical Coatings with demanding broadband specificationBanff,
Canada.
Sainty W G; McKenzie D R; Martin P J; Netterfield R P; Cockayne
D J H, and Dwarte D M. The structure and properties of ion-beam-synthesized
boron nitride films. J. Appl. Phys. 1988; 64(8):39806.
Sainty W G; Netterfield R P, and Martin P J. Protective dielectric
coatings produced by ion-assisted deposition. Proc. From the 12th
Int. Symp. on Plasma - Appl. Opt. Also Presented at the Ann. Meet.
Opt. Soc.America, New Orleans (1983. 1984; 23(3):11169.
Sarafis; V. and Hegedus, and Z.S. High efficiency modified Ryazanov
filters and their application. 1985.
Sarafis V and Hegedus Z S. High efficiency modified Ryazanov
filters and their application. Proc. of the 3rd Conf. of the Aust.
Opt. Soc - . 1985; M-8:256.
Sheppard; C.J.R. and Hegedus, and Z.S. Axial behaviour of pupil-plane
filters. J. Opt. Soc. Amer. 1988; A5 :643647.
Sheppard C J R and Hegedus Z S. Axial behaviour of pupil-plane
filters. J. Opt. Soc. Am. A. 1988; 5(5):6437.
Smith; M.W. Ng; R.J. Ditchbum; P.J. Martin, and R.P. Netterfield.
''Angular selective certnet films produced from a magnetically
filtered cathodic arc''. Proceedings of the SPIE - Optical Engineering.
1991; 1536, 126137.
Smith G B; Ng M W; Ditchburn R J; Martin P J, and Netterfield
R P. Angular selective cermet films produced from a magnetically
filtered cathodic arc. Proc. From the SPIE Conf. - . 1991; 1536:12637.
Smith G B; Ng M W anf Ditchburn R J; Martin P J, and Netterfield
R P. Cermets for angular selective transmittance. Sol. Energy
Mater. 1992; 25:14967.
Wieczorek L; Netterfield R P; Mitchell E; Woodhouse G; Cochrane
J; King L; Raguse B; Osman P; Separovic F, and Cornell B. Self
assembled organic ultrathin films. Invited Paper at the 2nd Aust.
Symp. on Molecular Eng. - . 1992.
Z Hegedus. Low Side-band guided-mode resonant filter. Applied
Optics. 1999.
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